로고

 

















ㆍ조회: 895  
  • 글제목
  • MCIK 2005 Annual Seminar on Rheology & Surface Chemistry with Special Focus on Semiconductor, Photo Resistors, Surfactants and Display Pannels Applications - Day 1
  • 작성자
  • MCIK
  • 작성일
  • 2010-08-13 (금) 16:04
  • 첨부#1
  • MCIK2005AnnualSeminar-1-Day1.pdf (128KB) (Down:57)
    Re: MCIK 2005 Annual Seminar on Rheology & Surface Chemistry with Special Focus on Semiconductor, Liquid Photo Resistors, Surfactants and Display Pannels (PDP, PLED, Colour Filters etc.) Applications
    Main topics to be discussed: Steady shear rheology, Thixotropy, Dynamic Oscillatory Measurements, Creep and Recovery,
    Normal Stress Difference N1 and N2, In-Line Process Viscomerty, Elongational Rheology, Optical Rheology, Contact Angle
    & Surface Energy, Surface Tension, Surfactants, Steric Stabilization, Dispersibility, DLVO, Zeta Potential and Surface
    Adhesion etc.


    안녕 하십니까?

    MCIK 의 Application Support Team 입니다.


    2005 MCIK Annual Seminar 를 아래와 같이 개최 하오니 참여를 희망하시는 분들께서는 첨부된 신청서를
    MCIK에 팩스 전송 부탁 드립니다:


    --------------------------------------------------------------------------------

    *Day-1: MCIK Annual Seminar 1-A
    제목: Fundamentals of Rheology and its Siginificance on Electronic Coating and Printing Appliactions
    Speaker: Dr. S. R. Kim (MCIK)
    일시 및 장소: 2005년 1월 18일 화요일 서울 강남구 삼성동 COEX Seminar Hall 403호
    접수 인원: 등록 선착순 60명.

    *Day-2: MCIK Annual Seminar 1-B
    제목: Fundamentals of Surface Chemistry and its Siginificance on Electronic Coating and Printing Appliactions /
    Surface Chemical Aspect of Rheology of Particulate Systems
    Speaker; Mr. Torsten Holz (DataPhysics GmbH, Germany) / Dr. S.R. Kim (MCIK)
    일시 및 장소: 2005년 1월 19일 수요일 서울 강남구 삼성동 COEX Seminar Hall 403호
    접수 인원: 등록 선착순 60명.

    --------------------------------------------------------------------------------


    건강하시고 즐거운 연말연시 보내시길 바랍니다.